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Could you please check my writing? That if I used proper words.
"In the SEMATECH BTU Bruce Horizontal Hot-Wall LPCVD system and similar systems, the gas can be injected in through two different entries (fig X) A) From one end of the furnace B) Perpendicular to the axis of the furnace. In the next, at first it is investigated that which entrance helps more in uniformity of layers. At the next step, by fluctuating pressure and temperature we discover which one has the most effective impact on the uniformity of the layers.
Previously, we studied type A, and now the simulation has performed for type B to investigate the differences caused by the changes of the injected gas. In type B, in contrast by type A, the molecules of the gas in the first place have an initial vertical speed vector, and before meeting the first wafer, encounter the opposite side of the furnace. That cause a twist in the flow of the gas, and unlike type A, the flow, tendentiously, does not make its headway to the exhausting outlet. Instead, the flow screws and forcefully is pushed, and finally finds its way out. According to Figure 2 and Figure 8, the disturbance of the temperature in type B has increased, therefore differences between the uniformity of type A and type B can be expected."

USF · Accepted Answer

Could anyone please check this? thanks. <img class='emoticon' style='Width:19px;Height:19px;' data-delaysrc='https://uat-englishforward-forums-backend.s3.us-west-2.amazonaws.com/Emoticons/1.gif' src='https://uat-englishforward-forums-backend.s3.us-west-2.amazonaws.com/Emoticons/1.gif' alt='Emotion: smile'/>

Enoon · Answer

In the SEMATECH BTU Bruce horizontal hot-wall LPCVD system and similar systems, the gas can be injected through one of two different points (fig. X): from one end of the furnace (what I will call "type A"), and perpendicular to the axis of the furnace (type B). In the next, at first it is investigated that which entrance helps more in uniformity of layers. At the next step, by varying pressure and temperature, we discover which one has the greatest effect on the uniformity of the layers. Previously, we studied type A, and now the simulation is performed for type B to investigate the differences caused by the change in the mode of injection of the gas. In type B, in contrast to type A, the molecules of the gas have an initial perpendicular speed vector and before meeting the first wafer encounter the opposite side of the furnace. That causes a twist in the flow of the gas, and unlike type A, the flow, tendentiously, does not make its headway to the exhausting outlet. Instead, the flow screws and forcefully is pushed, and finally finds its way out. According to Figure 2 and Figure 8, the disturbance of the temperature in type B has increased, therefore differences between the uniformity of type A and type B can be expected.

I don't understand the red parts.

USF · Answer

enoonIn the next, at first

I meant "next step is.. now we should at first"

enoon At the next step

Next step is ....

I wanted to show sequences of my work.

enoontendentiously

I was looking for something like "naturally". But because flow of gas is not predictable and we can just say that it would probably go this way, imagine the movement of smoke, then I tried this word. I used Google Translator

This is type A and B, and you can see in type B gas after injection encounter the opposite side of the tube and move arbitrary until it go out through other end.

enoonforcefully is pushed

I think you get it from the type B in picture, gas do not haven't horizontal speed vector and will be pushed to other end.

enoondisturbance of the temperature

I mean it is not uniform anymore.

Enoon · Answer

In the SEMATECH BTU Bruce horizontal hot-wall LPCVD system and similar systems, the gas can be injected through one of two different points (fig. X): from one end of the furnace (what I will call "type A"), and perpendicular to the axis of the furnace (type B). In the next part of the experiment, we test which injection point better contributes to the creation of uniform layers. In the following part, by varying pressure and temperature we discover which of those two factors has the greatest effect on the uniformity of the layers. Previously, we studied type A, and now the simulation is performed for type B to investigate the differences caused by the change in the mode of injection of the gas. In type B, in contrast to type A, the molecules of the gas have an initial perpendicular speed vector and before meeting the first wafer encounter the opposite side of the furnace. That causes a twist in the flow of the gas, and unlike in type A, the flow does not make its way smoothly to the exhaust outlet. Instead, the flow swirls and must be pushed, finally finding its way out. As seen in Figure 2 and Figure 8, inconsistency of temperature from wafer to wafer in type B has increased, and therefore differences between uniformity of deposition in type A and type B can be expected.

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